Nano-Lithography 

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2000

1999

1998

1997

1996

1995

1994

1993

1992

1991

1990

1998

M. Hashimoto, T. Koreeda and N. Koshida: "Application of dual-functional MoO3/WO3 bilayer resists to focused ion beam nanolithography", J. Vac. Sci. & Technol. B 16(5) (1998) 2767-2771.

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1996

M. Hashimoto , S. Watanuki and N. Koshida M. Komuro and N. Atoda: "Dual function of thin MoO3 and WO3 films as negative and positive resists for focused ion beam lithography.", Jpn. J. Appl. Phys. 35 (1996) 3665-3669.

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1994

T. Ikeda , M. Baba and N. Koshida: "Transition metal oxide resists for electron-beam and focused-ion-beam lithography.", J. Photopolym. Sci. & Technol. 7(3) (1994) 585-594.

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1992

N. Koshida , S. Watanuki , K. Yoshida et al.: "Electrical properties of nanometer-width refractory metal line fabricated by focused ion beam and oxide resists.", Jpn. J. Appl. Phys. 31 (1992) 4483-4486.

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1990

N. Koshida, H. Wachi, K. Yoshida, M. Komuro and N. Atoda: "Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists", Jpn. J. Appl. Phys. 29(10) (1990) 2299-2302.

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