Measurement of faradaic current during AFM local oxidation of magnetic metal thin films

Faradaic current during a local oxidation using an atomic force microscope was studied. The intensity of the measured faradaic current was increased with increasing bias voltage applied to a cantilever, resulting in fabrication of larger size of nano-oxide structures on Si substrates. On the other hand, an excess current (over current) that was considered not to contribute the oxidation reaction was observed noticeably in the local oxidation of NiFe thin films. It was found that the excess current could be suppressed by depositing insulating oxide layers on the surfaces. The surface oxide layers were also advantageous for stable existence of meniscus promoting the local oxidation because of their hydrophilic properties. This method of capped oxide layers is significant for stable performance of the local oxidation technique fabricating nanostructures and nano-devices.