Abstract
Scanning probe microscope (SPM) scratching with a diamond-coated tip on a Si surface was performed in a low-force regime of less than 9 µN. The influence of various scan parameters on the groove size was investigated. The groove size could be precisely controlled by the applied force, scan direction, and the number of scan cycles. There is no effect of the scan speed on the groove size. It is concluded that high-speed nanolithography can be achieved without the degradation of patterns by SPM scratching. Using this method, more complex nanostructures such as a line and space pattern with a pitch of 30 nm and a dot array of 2.6 ×1010 cm-2 density were successfully fabricated on a Si surface.