•½�¬18”N“x
13th International Conference on Metal Organic Vapor Phase Epitaxy, ICMOVPE-13, Phoenix Seagaia Resort, Miyazaki, Japan
1)
Improvement of crystalline quality of N-polar AlN layers on c-plane sapphire by low-pressure flow-modulated MOCVD
M. Takeuchi, H. Shimizu, K. Kawasaki, Y. Kumagai, A. Koukitu and Y. Aoyagi
2006
”N
5
ŒŽ
23
“ú, Tu-A1.3.
2)
MOVPE-like HVPE of AlN using Solid Aluminum Trichloride Source
K. Eriguchi, H. Murakami, U. Panyukova, Y. Kumagai, S. Ohira and A. Koukitu
2006
”N
5
ŒŽ
23
“ú, Tu-A1.7.
3)
Influences of surface atom arrangement on the growth of InN layers on GaAs (111)A and (111)B surfaces by metalorganic vapor phase epitaxy
Hisashi Murakami, Jun-ichi Torii, Yoshinao Kumagai and Akinori Koukitu
2006
”N
5
ŒŽ
26
“ú, Fr-A2.4.
First International Symposium on Growth of III-Nitrides, ISGN-1, Linköping, Sweden
4)
High-speed epitaxial growth of AlN above 1200�Ž by hydride vapor phase epitaxy
T. Nagashima, M. Harada, H. Yanagi, Y. Kumagai, A. Koukitu and K. Takada
2006 ”N 6 ŒŽ 5 “ú, MoP-07.
5)
Influence of hydrogen coverage on Si(111) substrate on the growth of GaN buffer layer
Y. Matsuo, Y. Kangawa, R. Togashi, K. Kakimoto and A. Koukitu
2006 ”N 6 ŒŽ 5 “ú, MoP-26.
6)
(Invited) Hydride vapor phase epitaxy of InN by the formation of InCl3 using In metal and Cl2
Y. Kumagai, J. Kikuchi, Y. Nishizawa, H. Murakami and A. Koukitu
2006 ”N 6 ŒŽ 5 “ú, MoI-6.
7)
(Invited) Thermodynamic approach to the growth of III-nitrides
Akinori Koukitu, Jun Kikuchi, Hisashi Murakami and Yoshinao Kumagai
2006 ”N 6 ŒŽ 5 “ú, TuI-7.
8)
Growth of AlxGa1-xN ternary alloy by hydride vapor phase epitaxy
T. Yamane, F. Satoh, H. Murakami, Y. Kumagai and A. Koukitu
2006 ”N 6 ŒŽ 5 “ú, WeP-17.
25th Electronic Materials Symposium, EMS-25, Linköping, Sweden
9)
Effect of arsenic desorption on MOVPE-grown InN layers on GaAs (111)A and (111)B surfaces
Hisashi Murakami, Jun-ichi Torii, Yoshinao Kumagai and Akinori Koukitu
2006 ”N 7 ŒŽ 5 “ú, B5.
15th International Conference on Crystal Growth, ICCG-15, Salt Lake City, UT, U.S.A.
10)
Influence of hydrogen input partial pressure on the polarity of InN on GaAs (111)A grown by metalorganic vapor phase epitaxy
Hisashi Murakami, Jun-ichi Torii, Yoshinao Kumagai, Akinori Koukitu
2006 ”N 8 ŒŽ 13“ú, wg 30.
11)
Ab initio calculation of decomposition GaN (0001) and (0001) surfaces
Hikari Suzuki, Rie Togashi, Hisashi Murakami, Yoshinao Kumagai, Akinori Koukitu
2006 ”N 8 ŒŽ 14“ú, s 09.
12)
In situ Gravimetric Monitoring of Decomposition Rate on the Surface of (10-12) r-plane Sapphire for the High Temperature Growth of non-polar AlN
Kazuhiro Akiyama, Hisashi Murakami, Yoshinao Kumagai, Akinori Koukitu
2006 ”N 8 ŒŽ 14“ú, 1117.
‘æ67‰ñ‰ž—p•¨—�Šw‰ïŠw�p�u‰‰‰ï, —§–½ŠÙ‘åŠw‚т킱�E‚‚³‚ƒLƒƒƒ“ƒpƒX
13)
Œ´—¿•ªŽq�§Œä–@‚É‚æ‚éƒTƒtƒ@ƒCƒA(0001)Šî”Â�ãInN‚ÌHVPE�¬’·
�¼àV—YŽ÷�C‹e’n���C‘º�ã�®, ŒF’J‹`’¼, ã–ã’–¾”Œ
2006 ”N 8 ŒŽ 29 “ú, 29a-C-9.
14)
In situƒOƒ‰ƒ”ƒBƒ�ƒgƒŠƒbƒN–@‚É‚æ‚é(0001)c–ʃTƒtƒ@ƒCƒA‚Ì•\–Ê•ª‰ð‰ß’ö‚Ì‚»‚Ì�ꑪ’è
�HŽR˜a”Ž�C�r–Ø‘ñ�l�C‘º�ã�®�CŒF’J‹`’¼�Cã–ã’–¾”Œ
2006 ”N 8 ŒŽ 29 “ú, 29p-E-3.
15)
GaN ƒoƒbƒtƒ@‘w�¬’·‚É‚¨‚¯‚é Si(111)Šî”•\–Ê‚Ì�…‘f”í•¢—¦‚̉e‹¿
�¼”ö—L—¢Žq, Ц�ì‹`—T, •xŠ~—�Œb, Š`–{�_ˆê, ã–ã’–¾”Œ
2006 ”N 8 ŒŽ 29 “ú, 29a-E-6.
16)
‘æˆêŒ´—�ŒvŽZ‹y‚ÑX�ü‹zŽû”÷�×�\‘¢‰ð�͂ɂæ‚é GaAs �‰ŠúŠî”Â�㔼�â‰��« GaN �¬’·‚ð–ÚŽw‚µ‚½ Fe ƒh�[ƒsƒ“ƒOƒ�ƒJƒjƒYƒ€‚̉ð–¾
•xŠ~—�Œb, �²“¡Žj—², ‘º�ã�®, ”ÑŒ´�‡ŽŸ, ŽRŒû�_Ži, ŒF’J‹`’¼, ã–ã’–¾”Œ
2006 ”N 8 ŒŽ 29 “ú, 29p-E-11.
17)
HVPE–@‚É‚æ‚éAlN‚Ì�‚‰·�E�‚‘¬ƒGƒsƒ^ƒLƒVƒƒƒ‹�¬’·
‰i“‡“O�CŒ´“cŠw�C–ö—T”V, ŒF’J‹`’¼, ã–ã’–¾”Œ�C�‚“c˜a�Æ
2006 ”N 8 ŒŽ 29 “ú, 29p-E-15.
18)
ƒTƒtƒ@ƒCƒA(0001)Šî”Â�ã‚Ö‚ÌAlN HVPE�¬’·‚É‚¨‚¯‚錴—¿‹Ÿ‹‹�‡�˜‚̉e‹¿
�¬ŸºŒ[—_�CŒ´“cŠw�C‰i“‡“O, ŒF’J‹`’¼, ã–ã’–¾”Œ
2006 ”N 8 ŒŽ 30 “ú, 30p-E-1.
4th International Workshop on Bulk Nitride Semiconductors, IWBNS-IV, Okubiwako Makino Prince Hotel, Makino, Shiga, Japan
19)
(Invited) HVPE growth of AlxGa1-xN ternary alloy using AlCl3 and GaCl
A. Koukitu, T. Yamane, F. Satoh, H. Murakami and Y. Kumagai
2006 ”N 10 ŒŽ 18 “ú.
20)
(Invited) Improvement of AlN crystalline quality with high epitaxial growth rate by hydride vapor phase epitaxy
T. Nagashima, M. Harada, A. Hakomori, H. Yanagi, H. Fukuyama, Y. Kumagai, A. Koukitu and K. Takada
2006 ”N 10 ŒŽ 18 “ú.
21)
(Invited) Improvement of crystalline quality for Al- and N-polar AlN layers by modified flow-modulation MOCVD growth
M. Takeuchi, H. Shimizu, R. Kajitani, K. Kawasaki, T. Kinoshita, K. Takada, H. Murakami, Y. Kumagai, A. Koukitu and Y. Aoyagi
2006 ”N 10 ŒŽ 20 “ú.
22)
(Invited) Polarity dependence of AlN {0001} decomposition in flowing H2
Y. Kumagai, K. Akiyama, R. Togashi, H. Murakami, M. Takeuchi, T. Kinoshita, K. Takada,
Y. Aoyagi, A. Kokitu
2006 ”N 10 ŒŽ 20 “ú.
23)
(Invited) RF-MBE growth of 2H-AlN templates by using a mode change MEE on Si(111) for HVPE growth
T. Ohachi, H. Shimomura, N. Yamabe, T. Yamane, Y. Kumagai and A. Koukitu
2006 ”N 10 ŒŽ 21 “ú.
24)
(Invited) Properties of Fe-doped semi-insulating GaN substrates for high-frequency device fabrication
J. A. Freitas, Jr., J. G. Tischler, J-H. Kim, Y. Kumagai and A. Koukitu
2006 ”N 10 ŒŽ 21 “ú.
International Workshop on Nitride Semiconductors 2006, IWN2006, Kyoto International Conference Hall, Kyoto University Katsura Campus, Ritsumeikan University Biwako-Kusatsu Campus
25)
A New System for Growing Thick InN Layers by Hydride Vapor Phase Epitaxy
Jun Kikuchi, Yuuki Nishizawa, Hisashi Murakami, Yoshinao Kumagai, Akinori Koukitu
2006 ”N 10 ŒŽ 23“ú, MoP1-8.
26)
In situ Gravimetric Monitoring of Decomposition Rate on the Surface of (0001) c-plane Sapphire for the High Temperature Growth of AlN
Kazuhiro Akiyama, Takuto Araki, Hisashi Murakami, Yoshinao Kumagai, Akinori Koukitu
2006 ”N 10 ŒŽ 24“ú, TuP1-82.
27)
First-principles calculation and X-ray absorption fine structure analysis of Fe doping mechanism for semi-insulating GaN growth on GaAs substrates
R. Togashi, F. Satoh, H. Murakami, J. Iihara, K.Yamaguchi, Y. Kumagai and A. Kokitu
2006 ”N 10 ŒŽ 25“ú, WeG3-3.
‘æ36‰ñŒ‹�»�¬’·�‘“à‰ï‹c, NCCG-36, ‘å�ã‘åŠwƒRƒ“ƒxƒ“ƒVƒ‡ƒ“ƒZƒ“ƒ^�[
28)
GaN(0001)/(0001) –ʂ̕\–Ê�Ä�\�¬–ʂ̉ð�Í
—é–Ø‚Ђ©‚è, •xŠ~—�Œb, ŒF’J‹`’¼, ã–ã’–¾”Œ
2006 ”N 11 ŒŽ 1“ú, 01aC08.
29)
Theoretical investigation of Al desorption process from (0001) AlN surface
U. Panyukova, H.Suzuki, R. Togashi, H. Murakami, Y.Kumagai and A. Koukitu
2006 ”N 11 ŒŽ 1“ú, 01aC09.
30)
HVPE–@‚ð—p‚¢‚½AlGaNŽOŒ³�¬�»ƒGƒsƒ^ƒLƒV�[
�²“¡Žj—², ŽR�ª‹M�D�C�HŽR˜a”Ž�C‘º�ã�®�CŒF’J‹`’¼�Cã–ã’–¾”Œ
2006 ”N 11 ŒŽ 1“ú, 01aA11.
31)
GaAs�‰ŠúŠî”Â�㔼�â‰��«GaN�¬’·‚ÉŒü‚¯‚½Feƒh�[ƒsƒ“ƒOƒ�ƒJƒjƒYƒ€‚̉ð–¾
•xŠ~—�Œb, �²“¡Žj—², ‘º�ã�®, ”ÑŒ´�‡ŽŸ, ŽRŒû�_Ži, ŒF’J‹`’¼, ã–ã’–¾”Œ
2006 ”N 11 ŒŽ 1“ú, 01aA12.
‘æ54‰ñ‰ž—p•¨—�ŠwŠÖŒW˜A�‡�u‰‰‰ï, �ÂŽRŠw‰@‘åŠw
32)
�‚‰·H2•µˆÍ‹C‰º‚É‚¨‚¯‚é{0001}AlN •ª‰ð‚Ì–Ê‹É�«ˆË‘¶�«
�HŽR˜a”Ž, ŒF’J‹`’¼, •�“à“¹ˆê, ‘º�ã�®, •xŠ~—�Œb, –؉º‹œ, �‚“c˜a�Æ, �–ö�Ž�M, ã–ã’–¾”Œ
2007 ”N 3 ŒŽ 27 “ú, 27a-ZM-5.
33)
3C-SiC/Siƒeƒ“ƒvƒŒ�[ƒg�ã‚Ö‚ÌAlN‚ÌHVPE�¬’·
�]—¢ŒûŒ’ˆê, ŽR�ª‹M�D�C‘º�ã�®�CŒF’J‹`’¼�C�¬‹{ŽR�ƒ�Cã–ã’–¾”Œ
2007 ”N 3 ŒŽ 27 “ú, 27a-ZM-9.
34)
GaNŽ©—§Šî”Â�ã‚Ö‚ÌAlGaN‚ÌHVPE�¬’·
�²“¡Žj—², ŽR�ª‹M�D�C�HŽR˜a”Ž�C‘º�ã�®�CŒF’J‹`’¼�Cã–ã’–¾”Œ
2007 ”N 3 ŒŽ 27 “ú, 27p-ZM-6.